Annealing effects in the delamination of H+ implanted silicon
- 著者名:
Hara, T. Kakizaki, Y. Oshima, S. Kitamura, T. Kajiyama, K. Yoneda, T. Sekine, K. Inoue, M. - 掲載資料名:
- Proceedings of the Eighth International Symposium on Silicon-on-Insulator Technology and Devices
- シリーズ名:
- Electrochemical Society Proceedings Series
- シリーズ巻号:
- 97-23
- 発行年:
- 1997
- 開始ページ:
- 33
- 終了ページ:
- 38
- 出版情報:
- Pennington, NJ: Electrochemical Society
- ISSN:
- 01616374
- ISBN:
- 9781566771764 [1566771765]
- 言語:
- 英語
- 請求記号:
- E23400/97-23
- 資料種別:
- 国際会議録
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