Blank Cover Image

Parametric Study of Plasma Uniformity in a Dome-Shaped Inductively Coupled Plasma Reactor

著者名:
掲載資料名:
Proceedings of the Second International Symposium on Process Control, Diagnostics, and Modeling in Semiconductor Manufacturing
シリーズ名:
Electrochemical Society Proceedings Series
シリーズ巻号:
97-9
発行年:
1997
開始ページ:
260
終了ページ:
267
出版情報:
Pennington, NJ: Electrochemical Society
ISSN:
01616374
ISBN:
9781566771368 [1566771366]
言語:
英語
請求記号:
E23400/97-9
資料種別:
国際会議録

類似資料:

1 国際会議録 Transport and Reaction in Inductively Coupled Plasmas for Microelectronics

Economou J. D., Feldsien J., Wise S. R.

Lenum Press
7 国際会議録 Modeling Potential Distribution Transport and Reaction in Gas Plasmas

Economou, D.J.

Electrochemical Society
2 国際会議録 A TCAD Simulation Tool for Inductively Coupled Plasmas and Ex- perimental Validation

Economou, D.J., Wise, R.S., Lymberopoulos, D.P.

Electrochemical Society
8 国際会議録 Modeling of Pulsed-Power Inductively Coupled Plasma Reactors

Bukowski, J.D., Stewart, R.A., Graves, D.B., Vitello, P.

Electrochemical Society
3 国際会議録 Modeling and Simulation of Two-Dimensional Reactive Plasma Flow in Inductively Coupled Reactors

Lymberopoulos, D., Wise, R., Economou, D.

Electrochemical Society
9 国際会議録 Inductively coupled plasma etch of DUV MoSi photomasks:a designed study of etch chemistries and process results

Constantine,C., Johnson,D.J., Westerman,R.J., Hourd,A.C.

SPIE - The International Society for Optical Engineering
4 国際会議録 Parametric Study of Compound Semiconductor Etching Utilizing Inductively Coupled Plasma Source

Constantine, C., Johnson, D., Barratt, C., Shul, R. J., McClellan, G. B., Briggs, R. D., Rieger, D. J., Karlicek, R. F., …

MRS - Materials Research Society
10 国際会議録 Uniformity studies of inductively coupled plasma etching in fabrication of HgCdTe detector arrays

R. Bommena, S. Velicu, P. Boieriu, T. S. Lee, C. H. Grein, K. K. Tedjojuwono

SPIE - The International Society of Optical Engineering
5 国際会議録 Modeling and Simulation of Inductively Coupled High Density Plasma Sources

Economou, D., Lymberopoulos, D.

Electrochemical Society
11 国際会議録 Inductively-Coupled Plasma Deposition of Low Temperature Silicon Dioxide and Silicon Nitride Films for III-V Applications

Mackenzie, K.D., Lee, J.W, Johnson, D.J.

Electrochemical Society
6 国際会議録 Direct Simulation Monte Carlo of Inductively Coupled Plasma and Comparison with Experiment

Johannes, J., Bartel, T., Hebner, G., Woodworth, J., Economou, D.

Electrochemical Society
12 国際会議録 Inductively Coupled Plasma Test Reactor Development and Plasma Measurements

Monteiro, M. J. R., Kostryukov, A., Daltrini, A. M., Moshkalyov, S. A., Machida, M., Besseler, E.

Electrochemical Society
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12