Blank Cover Image

Mass Spectrometer Sensing and Control of Plasma-Enhanced Silicon Nitride Deposition

著者名:
掲載資料名:
Proceedings of the Symposium on Silicon Nitride and Silicon Dioxide Thin Insulating Films
シリーズ名:
Electrochemical Society Proceedings Series
シリーズ巻号:
97-10
発行年:
1997
開始ページ:
537
終了ページ:
551
総ページ数:
15
出版情報:
Pennington, New Jersey: Electrochemical Society
ISSN:
01616374
ISBN:
9781566771375 [1566771374]
言語:
英語
請求記号:
E23400/97-10
資料種別:
国際会議録

類似資料:

1 国際会議録 Model Predictive Control of Plasma Enhanced Chemical Vapor Deposition with Process Variable Constraints

Cheng, X., Knight, T.J., Greve, D.W., Krogh, B.H.

Electrochemical Society
7 国際会議録 High-quality silicon nitride films prepared by low-frequency plasma-enhanced chemical vapor deposition

H. Zhang, X. Xu, Y. Leng, W. Li, Z. Wu

Society of Photo-optical Instrumentation Engineers
2 国際会議録 Application of Sampling Quadrupole Mass Spectrometry to Multivarible Process Control

Knight, T.J., Cheng, X., Krogh, B.H., Greve, D.W., Gibson, M.A.

Electrochemical Society
8 国際会議録 DEPOSITION OF FLUORINATED SILICON NITRIDE USING PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION TECHNIQUE

Khan, I., Naseem, H.A., Ang, S.S., Brown, W.D.

Materials Research Society
3 国際会議録 Real-Time Control of PECVD Silicon Nitride Film Properties

Knight, T.J., Grave, D.W., Cheng, X., Krogh, B.H.

Electrochemical Society
9 国際会議録 Field Emission Properties of Nanocrystalline and Amorphous Silicon Carbon Nitride Prepared from Microwave Plasma Chemical Vapor Deposition

Cheng, W. J., Jiang, J. C., Zhang, Y., Shen, D. Z., Zhu, H. S.

Trans Tech Publications
4 国際会議録 PLASMA CHEMISTRY CONTROL OF SILICON NITRIDE DEPOSITION

Smith, D.L., Alimonda, A.S., Chen, C-C., Jackson, W., Wacker, B.

Materials Research Society
10 国際会議録 DEPOSITION CHEMISTRY AND STRUCTURE OF AMORPHOUS FLUORINATED SILICON NITRIDE

Petrich, M.A., Livengood, R.E., Hess, D.W., Reimer, J.A.

Materials Research Society
5 国際会議録 Polymorphous Silicon Nanowires Synthesized by Plasma-Enhanced Chemical Vapor Deposition

Zeng, X.B., Liao, X.B., Diao, H.W., Hu, Z.H., Xu, Y.Y., Zhang, S.B., Chen, C.Y., Chen, W.D., Kong, G.L.

Materials Research Society
11 国際会議録 Gate-Quality Silicon Nitride Films On Silicon By Jet Vapor Deposition

Wang, X., Ma, T.P., Cui, G.-J., Tamagawa, T., Golz, J.W., Schmitt, J.J., Halpern, B.L.

Electrochemical Society
6 国際会議録 DEPOSITION OF TITANIUM NITRIDE THIN FILMS BY PLASMA ENCHANCED CVD AND REACTIVE SPUTTERING

Gleason, E.F., Hess, D.W.

Materials Research Society
12 国際会議録 IN SITU CONTROL OF ENERGY BANDGAP BY LASER ENHANCED METALOGANIC CHEMICAL VAPOR DEPOSITION

Epler, J.E., Chung, H.F., Treat, D.W., Paoli, T.L.

Materials Research Society
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12