Electrical Characterization of Fluorinated and Nitrided Gate Oxides Under Negative-Bias Fowler-Nordheim Stress
- 著者名:
Nguyen, T.K. Landsberger, L. Belkouch, S. Jean, C. Kahrizi, M. Logiudice, V. - 掲載資料名:
- Proceedings of the Symposium on Silicon Nitride and Silicon Dioxide Thin Insulating Films
- シリーズ名:
- Electrochemical Society Proceedings Series
- シリーズ巻号:
- 97-10
- 発行年:
- 1997
- 開始ページ:
- 194
- 終了ページ:
- 205
- 総ページ数:
- 12
- 出版情報:
- Pennington, New Jersey: Electrochemical Society
- ISSN:
- 01616374
- ISBN:
- 9781566771375 [1566771374]
- 言語:
- 英語
- 請求記号:
- E23400/97-10
- 資料種別:
- 国際会議録
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