Electrochemical Interaction Between Copper and Barrier Materials Using Chemical Mechanical Polishing
- 著者名:
- Evans, D.R.
- 掲載資料名:
- Proceedings of the First International Symposium on Chemical Mechanical Planarization
- シリーズ名:
- Electrochemical Society Proceedings Series
- シリーズ巻号:
- 96-22
- 発行年:
- 1996
- 開始ページ:
- 70
- 終了ページ:
- 78
- 総ページ数:
- 9
- 出版情報:
- Pennington, NJ: Electrochemical Society
- ISSN:
- 01616374
- ISBN:
- 9781566771726 [1566771722]
- 言語:
- 英語
- 請求記号:
- E23400/970318
- 資料種別:
- 国際会議録
類似資料:
Electrochemical Society |
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8
国際会議録
XPS and Electrochemical Studies on Tungsten-Oxidizer Interaction in Chemical-Mechanical Polishing
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