Effect of Fluorocarbon Polymer Buildup on Etching Atmosphere and Contact Etching

Effect of Fluorocarbon Polymer Buildup on Etching Atmosphere and Contact Etching

著者名:

掲載資料名:

Proceedings of the eleventh International Symposium on Plasma Processing

シリーズ名:

Electrochemical Society Proceedings Series

シリーズ巻号:

96-12

発行年:

1996

開始ページ:

492

終了ページ:

498

総ページ数:

7

出版情報:

Pennington, NJ: Electrochemical Society

ISSN:

01616374

ISBN:

9781566771641 [1566771641]

言語:

英語

請求記号:

E23400/962354

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00013845
シリーズID:	PA00000028
会議名:	International Symposium on Plasma Processing ; Meeting of the Electrochemical Society
回次:	11th ; 189th
会議開催地:	Los Angels, CA, USA
会議開催年:	1996.05.05-1996.05.10

類似資料:

1 国際会議録 A Microstructural and Electrical Investigation of Pd/Ge/Ti/Au Ohmic Contact to n-Type GaAs Kwak, J. S., Baik, H. K., Kim, H., Lee, J.-L., Shin, D. W., Park, C. G. MRS - Materials Research Society	7 国際会議録 Non-chemically amplified 193-nm top surface imaging photoresist development: polymer substituent and polydispersity effects Kim, M. -S., Kim, H. -G., Kim, H. -S., Baik, K. -H., Johnson, D. W., Cernigliaro, G. J., Minsek, D. W. SPIE - The International Society of Optical Engineering
2 国際会議録 THE FORMATION AND REMOVAL OF RESIDUE FORMED DURING TiN FLUOROCARBON PLASMA ETCHING Kim, Y.B., Conard, T., Vanhaeren, D., Baklanov, M., Vanhaelemeersch, S., Vandervorst, W., Maex, K. Electrochemical Society	8 国際会議録 Plasma Etching for the Application to Low-K Dielectrics Devices J.W. Lee, H.W. Kim, J.W. Han, M.S. Kim, B.D. Yoo, M.H. Kim, C.H. Lee, C.H. Lim, S.K. Hwang, C. Lee, D.J. Chung, S.G. … Trans Tech Publications
3 国際会議録 Mechanism of Polycrystalline Silicon Etching in a Fluorocarbon Plasma Cho, B-O., Hwang, S-W, Kim, I-W, Moon, S.H. Electrochemical Society	9 国際会議録 Characterization of polymer formation during Si02 etching with different fluorocarbon gases (CHF3,CF4,C4F8) Loong,S.Y., Lee,H.K., Chan,L.H., Zhou,M.S., Loh,F.C., Tan,K.L. SPIE-The International Society for Optical Engineering
4 国際会議録 Micromechanical analysis of residual stress effect in CVD-processed diamond wafer Jeong, J-H., Kwon, D., Lee, J-K., Lee, W-S., Baik, Y-J. MRS-Materials Research Society	10 国際会議録 Improved lithographic performance of 193-nm photoresists based on cycloolefin/maleic anhydride copolymer by employing mixed PAGs Choi,S.-J., Choi,Y.-J., Kim,Y.-S., Kim,S.-D., Kim,D.-B., Kim,J.-H., Koh,C.-W., Lee,G., Jung,J.-C., Baik,K.-H. SPIE-The International Society for Optical Engineering
5 国際会議録 90nm technology contact CD performance characterization via ODP scatterometry Jeon, B.-T., Kim, O.-H., Baik, J.-H., Ha, J.-H., Lee, I.-H., Yang, W.-S. SPIE - The International Society of Optical Engineering	11 国際会議録 Contact hole CD and profile metrology of binary and phase-shift masks: effect of modeling strategies in application of scafferometery [6349-22] Lee, K., Yedur, S., Tavassoli, M., Baik, K., Tabet, M. SPIE - The International Society of Optical Engineering
6 国際会議録 EFFECT OF H2O2 AND IPA ADDITION IN DILUTE HF SOLUTION ON SURFACE ETCHING AND PARTICLE REMOVAL EFFICIENCY Eom, D.-H., Lee, S.-H., Kim, K.-S., Lee, C.-H., Park, J.-G. Electrochemical Society	12 国際会議録 Modeling of the comb actuator deformed by microloading effect in deep reactive ion etching Lee,J.-Y., Kim,S.-H., Lim,H.-T., Kim,C.-H., Kim,Y.-K. SPIE-The International Society for Optical Engineering

1

2

3

4

5

6

7

8

9

10

11

12