Characterization of Polysilicon and Polycide Etch Processes for Submicron Manufacturing
- 著者名:
- 掲載資料名:
- Proceedings of the eleventh International Symposium on Plasma Processing
- シリーズ名:
- Electrochemical Society Proceedings Series
- シリーズ巻号:
- 96-12
- 発行年:
- 1996
- 開始ページ:
- 374
- 終了ページ:
- 385
- 総ページ数:
- 12
- 出版情報:
- Pennington, NJ: Electrochemical Society
- ISSN:
- 01616374
- ISBN:
- 9781566771641 [1566771641]
- 言語:
- 英語
- 請求記号:
- E23400/962354
- 資料種別:
- 国際会議録
類似資料:
Electrochemical Society |
Electrochemical Society |
Electrochemical Society |
Electrochemical Society |
3
国際会議録
Anisotropic Polysilicon Etch without the Use of Chlorofluorocarbons in a Parallel Plate Reactor
Electrochemical Society |
SPIE-The International Society for Optical Engineering |
Electrochemical Society |
Electrochemical Society |
Electrochemical Society |
Electrochemical Society |
6
国際会議録
OPTIMIZATION OF EQUIPMENT PROCESSES TO MINIMIZE SUBMICRON TECHNOLOGY METAL ETCH CORROSION DEFECTS
Electrochemical Society |
Electrochemical Society |