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Enhanced Pulsed Plasma Operation by Suppressing Side Band Modes

著者名:
Chi, K.K.
Hahm, J.H.
Shin, K.S.
Shin, H.S.
Jung, C.O.
Koh, Y.B.
Lee, M.Y.
さらに 2 件
掲載資料名:
Proceedings of the eleventh International Symposium on Plasma Processing
シリーズ名:
Electrochemical Society Proceedings Series
シリーズ巻号:
96-12
発行年:
1996
開始ページ:
96
終了ページ:
105
総ページ数:
10
出版情報:
Pennington, NJ: Electrochemical Society
ISSN:
01616374
ISBN:
9781566771641 [1566771641]
言語:
英語
請求記号:
E23400/962354
資料種別:
国際会議録

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