A TCAD Simulation Tool for Inductively Coupled Plasmas and Ex- perimental Validation

A TCAD Simulation Tool for Inductively Coupled Plasmas and Ex- perimental Validation

著者名:

掲載資料名:

Proceedings of the eleventh International Symposium on Plasma Processing

シリーズ名:

Electrochemical Society Proceedings Series

シリーズ巻号:

96-12

発行年:

1996

開始ページ:

11

終了ページ:

19

総ページ数:

9

出版情報:

Pennington, NJ: Electrochemical Society

ISSN:

01616374

ISBN:

9781566771641 [1566771641]

言語:

英語

請求記号:

E23400/962354

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00013845
シリーズID:	PA00000028
会議名:	International Symposium on Plasma Processing ; Meeting of the Electrochemical Society
回次:	11th ; 189th
会議開催地:	Los Angels, CA, USA
会議開催年:	1996.05.05-1996.05.10

類似資料:

1 国際会議録 Modeling and Simulation of Two-Dimensional Reactive Plasma Flow in Inductively Coupled Reactors Lymberopoulos, D., Wise, R., Economou, D. Electrochemical Society	7 国際会議録 Modeling Inductively Coupled Plasma Tools with Chlorine Chemistry Bukowski, J.D., Stewart, R. A., Graves, D.B., Vitello, P. Electrochemical Society
2 国際会議録 Modeling and Simulation of Inductively Coupled High Density Plasma Sources Economou, D., Lymberopoulos, D. Electrochemical Society	8 国際会議録 Modeling of Pulsed-Power Inductively Coupled Plasma Reactors Bukowski, J.D., Stewart, R.A., Graves, D.B., Vitello, P. Electrochemical Society
3 国際会議録 Transport and Reaction in Inductively Coupled Plasmas for Microelectronics Economou J. D., Feldsien J., Wise S. R. Lenum Press	9 国際会議録 DIAMOND DEPOSITION USING A PLANAR RADIO FREQUENCY INDUCTIVELY COUPLED PLASMA Bozeman, S.P., Tucker, D.A., Stoner, B.R., Glass, J.T., Hook, W.M. Electrochemical Society
4 国際会議録 SELF-CONSISTENT SIMULATIONS OF RF GLOW DISCHARGES COUPLED WITH NEUTRAL TRANSPORT AND REACTION Economou, D., Lymberopoulos, D.P. Electrochemical Society	10 国際会議録 Inductively-Coupled Plasma Etching of NiFe and NiFeCo Jung, K. B., Childress, J. R., Pearton, S. J., Jenson, M., Hurst, A. T., Jr., Johnson, D. MRS - Materials Research Society
5 国際会議録 Parametric Study of Plasma Uniformity in a Dome-Shaped Inductively Coupled Plasma Reactor Economou, D.J., Feldsien, J. Electrochemical Society	11 国際会議録 Modeling Potential Distribution Transport and Reaction in Gas Plasmas Economou, D.J. Electrochemical Society
6 国際会議録 Direct Simulation Monte Carlo of Inductively Coupled Plasma and Comparison with Experiment Johannes, J., Bartel, T., Hebner, G., Woodworth, J., Economou, D. Electrochemical Society	12 国際会議録 Parametric Study of Compound Semiconductor Etching Utilizing Inductively Coupled Plasma Source Constantine, C., Johnson, D., Barratt, C., Shul, R. J., McClellan, G. B., Briggs, R. D., Rieger, D. J., Karlicek, R. F., … MRS - Materials Research Society

1

2

3

4

5

6

7

8

9

10

11

12