Blank Cover Image

Comparison Between Theory and Experiment for Large CVD Rotating Disk Reactors

著者名:
掲載資料名:
Proceedings of the Thirteenth International Symposium on Chemical Vapor Deposition
シリーズ名:
Electrochemical Society Proceedings Series
シリーズ巻号:
96-5
発行年:
1996
開始ページ:
101
終了ページ:
106
総ページ数:
6
出版情報:
Pennington, NJ: Electrochemical Society
ISSN:
01616374
ISBN:
9781566771559 [1566771552]
言語:
英語
請求記号:
E23400/962104
資料種別:
国際会議録

類似資料:

1 国際会議録 MOCVD Production of III-V Nitride Materials in a Multi-Wafer Rotating Disk Reactor

Liu, H., Thompson, A.G., Chern, C.S., Zawadzki, P.A., Kroll, W.J., Stall, R.A., Hwang, C-Y., Mayo, W.E.

Electrochemical Society
7 国際会議録 DEVELOPMENT AND IMPLEMENTATION OF LARGE AREA, ECONOMICAL ROTATING DISK REACTOR TECHNOLOGY FOR METALORGANIC CHEMICAL VAPOR DEPOSTION

Tompa, G. S., Zawadzki, P. A., McKee, M., Wolak, E., Moy, K., Stall, R. A., Gurary, A., Schumaker, N. E.

MRS - Materials Research Society
2 国際会議録 New Level of Thermal Management in Vertical CVD Rotating Disk Reactor Technology

Gurary, A.I., Tompa, G.S., Thompson, A.G., Stall, R.A., Kroll, W.J., Schumaker, N.E.

Electrochemical Society
8 国際会議録 ATOMIC LAYER EPITAXY IN A ROTATING DISK REACTOR

Liu, H., Zawadzki, P. A., Norris, P. E.

Materials Research Society
3 国際会議録 Epitaxial growth technologies for HB-LED manufacturing

Thompson,A.G., Armour,E.A., Collins,D., Zawadzki,P.A., Karlicek,R.F.,Jr., Stall,R.A.

SPIE-The International Society for Optical Engineering
9 国際会議録 Si Atom Density Profiles In a Rotating Disk CVD Reactor

Ho, P., Breiland, W.G., Coltrin, M.E.

Electrochemical Society
4 国際会議録 A Two-Dimensional Numerical Model of Gas Mixing and Deposition in a Rotating Disk CVD Reactor

Winters, W.S., Evans, G.H.

Electrochemical Society
10 国際会議録 Turbulence and its Influence on Mass Transfer in a Rotating Disk CVD Reactor

Van Santen, H., Kleijn, C.R., Van Den Akker, H.E.A.

Electrochemical Society
5 国際会議録 PRODUCING AND CONTROLLING SUBSTRATE TEMPERATURE UNIFORMITY FROM 600｡？TO 1100｡？IN CVD ROTATING DISK REACTORS

Gurary, A. I., Tompa, G. S., Stall, R. A., Kroll, W. J., Zawadzki, P., Schumaker, N. E.

MRS - Materials Research Society
11 国際会議録 Deposition of Titanium Nitride Films in a Stagnation Flow Reactor and Comparison With Model Predictions

Allendorf, M.D., Arsenlis, A., Bastasz, R., Evans, G.H., Larson, R.S., Schulberg, M.T.

Electrochemical Society
6 国際会議録 Vertical high-speed rotating disk reactors for production scale MOVPE of compound semiconductors

R.C. Walker, A. Thompson, G.S. Tampa, P.A. Zawadzki, A. Gurary

Society of Photo-optical Instrumentation Engineers
12 国際会議録 THEORETICAL ANALYSIS OF A ROTATING-DISK CHEMICAL VAPOR DEPOSITION REACTOR

Coltrin, Michael E., Breiland, William G., Evans, Gregory H., Kee, Robert J.

American Institute of Chemical Engineers
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12