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The Effect of TiSi2 Film Thickness and Growth on the Point Defect Perturbance in Si

著者名:
Hemer, S.B.
Jones, K.S.
Gossman, H.-J.
Tung, R.T.
Poate, J.M.
Luftman, H.S.
さらに 1 件
掲載資料名:
Proceedings of the Fourth International Symposium on Process Physics and Modeling in Semiconductor Technology
シリーズ名:
Electrochemical Society Proceedings Series
シリーズ巻号:
96-4
発行年:
1996
開始ページ:
337
終了ページ:
347
出版情報:
Pennington, NJ: Electrochemical Society
ISSN:
01616374
ISBN:
9781566771542 [1566771544]
言語:
英語
請求記号:
E23400/961823
資料種別:
国際会議録

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