CHARACTERIZATION OF SILICON OXIDE ETCHING IN GAS PHASE HF/VAPOR MIXTURES

CHARACTERIZATION OF SILICON OXIDE ETCHING IN GAS PHASE HF/VAPOR MIXTURES

著者名:

Muscat, Anthony J.

掲載資料名:

Proceedings of the Fourth International Symposium on Cleaning Technology in Semiconductor Device Manufacturing

シリーズ名:

Electrochemical Society Proceedings Series

シリーズ巻号:

95-20

発行年:

1995

開始ページ:

371

終了ページ:

378

総ページ数:

8

出版情報:

Pennington, NJ: Electrochemical Society

ISSN:

01616374

ISBN:

9781566771153 [1566771153]

言語:

英語

請求記号:

E23400/962140

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00013825
シリーズID:	PA00000028
会議名:	International Symposium on Cleaning Technology in Semiconductor Device Manufacturing ; Fall Electrochemical Society Meeting
回次:	4th
会議開催地:	Chicago, Illinois, USA
会議開催年:	1995.10.00

類似資料:

1 国際会議録 Etching of Silicon Oxide by HF/Solvent Mixtures Condensed from a Vapor Phase Muscat, A.J., Lawing, A.S., Xu, H., Sawin, H.H. American Institute of Chemical Engineers	7 国際会議録 Silicon surface micromachining by anhydrous HF gas-phase etching with methanol Jang,W.I., Choi,C.A., Lee,C.S., Hong,Y.S., Lee,J.H., Baek,J.T., Kim,B.W. SPIE-The International Society for Optical Engineering
2 国際会議録 UV/CL2 ETCHING AND CLEANING OF WAFER SURFACES Lawing, A. Scott, Muscat, Anthony J., Sawin, Herbert H., Butterbaugh, Jeffrey W. Electrochemical Society	8 国際会議録 Characterization of Oxide Etching and Wafer Cleaning Using Vapor-Phase Anhydrous HF and Ozone Froeschle, Barbara, Deutschmann, Lutz, Bauer, Anton J., Burte, Edmund P. MRS - Materials Research Society
3 国際会議録 GAS-PHASE ETCHING OF SILICON OXiDE WITH ANHYDROUS HF AND ISOPROPANOL Butterbaugh, J.W., Hiatt, C.F., Gray, D.C. Electrochemical Society	9 国際会議録 Characterization of a Batch HF Vapor Processor for MEMS Release Etching Chiaroni, J., Grange, H., Pallet, O., Bergman, E. Electrochemical Society
4 国際会議録 CHARACTERIZATION OF SILICON OXIDE ETCHING IN HF VAPOR PROCESSES Han, Y.-P., Lawing, S., Sawin, H. Electrochemical Society	10 国際会議録 Comparison between wet HF etching and vapor HF etching for sacrificial oxide removal Witvrouw,A., Bois,B.Du, Moor,P.De, Verbist,A., Hoof,C.A.Van, Bender,H., Baert,K. SPIE-The International Society for Optical Engineering
5 国際会議録 Post Oxide Etching Cleaning Process Using Integrated Ashing and HF Vapor Process Kwon, O., Sawin, H. Electrochemical Society	11 国際会議録 REMOVAL OF POLYMERIC/SILICATE RESIDUES AND REDUCTION OF CONTACT RESISTANCE FOR INTER-METAL VIA HOLES BY VAPOR PHASE HF CLEANING Tong, J.K., Martin, J.S., Rogers, T.C., Syverson, D.J. Electrochemical Society
6 国際会議録 Characteristics of residual products in HF gas-phase etching of sacrificial oxides for silicon micromachining Jang,W.-I., Choi,C.-A., Lee,C.-S., Hong,Y.-S., Lee,J.-H. SPIE - The International Society for Optical Engineering	12 国際会議録 310d. 3-Dimensional Monte Carlo Profile Simulation and Experimental Measurements of Surface Roughness Under Plasma Etching Wei Guo, Hiroyo Kawai, Herbert H. Sawin American Institute of Chemical Engineers

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