REMOVAL OF POLYMERIC/SILICATE RESIDUES AND REDUCTION OF CONTACT RESISTANCE FOR INTER-METAL VIA HOLES BY VAPOR PHASE HF CLEANING

REMOVAL OF POLYMERIC/SILICATE RESIDUES AND REDUCTION OF CONTACT RESISTANCE FOR INTER-METAL VIA HOLES BY VAPOR PHASE HF CLEANING

著者名:

掲載資料名:

Proceedings of the Fourth International Symposium on Cleaning Technology in Semiconductor Device Manufacturing

シリーズ名:

Electrochemical Society Proceedings Series

シリーズ巻号:

95-20

発行年:

1995

開始ページ:

235

終了ページ:

242

総ページ数:

8

出版情報:

Pennington, NJ: Electrochemical Society

ISSN:

01616374

ISBN:

9781566771153 [1566771153]

言語:

英語

請求記号:

E23400/962140

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00013825
シリーズID:	PA00000028
会議名:	International Symposium on Cleaning Technology in Semiconductor Device Manufacturing ; Fall Electrochemical Society Meeting
回次:	4th
会議開催地:	Chicago, Illinois, USA
会議開催年:	1995.10.00

類似資料:

1 国際会議録 A STUDY OF THE EFFECTIVENESS OF VAPOR PHASE CLEANS FOR ADVANCED GATE OXIDATION Tong, J.K., Hanger, G.F., Becker, D.S., Syverson, D.J. Electrochemical Society	7 国際会議録 COMPARISON OF VAPOR-PHASE AND WET CHEMICAL PRE-GATE OXIDE AND PRE-CONTACT CLEANS Draper, C.W., Anyanwu, V.E., Eisenberg, J.H., Felton, G.J., Roy, P.K., Chittipeddi, S., Bechtold, P.F., Hagner, G., … Electrochemical Society
2 国際会議録 iN SiTU SURFACE ANALYSIS IN HF VAPOR-PHASE CLEANING OF Si Oostra, D.J., Hakkens, F.J.G. Electrochemical Society	8 国際会議録 Novel Resistance Reduction and Phase Changes of Contacts to n-Type InP by Rapid Thermal Annealing Huang, J.S., Nguyen, T., Bar-Chaim, N., Vartuli, C.B., Anderson, S., Shearer, J., Fisher, C. Materials Research Society
3 国際会議録 CHARACTERIZATION OF SILICON OXIDE ETCHING IN GAS PHASE HF/VAPOR MIXTURES Muscat, Anthony J., Lawing, Scott A., Sawin, Herbert H., Butterbaugh, Jeff, Syverson, Dan, Hiatt, Fred Electrochemical Society	9 国際会議録 Application of Microwave Downstream Plasma for Cleaning: Post Via-Etch Residue Removal Deshmukh, S., Burke, R., Chang, J., Cheng, C.C. Electrochemical Society
4 国際会議録 THE ROLE OF OXIDE IMPURITIES IN SURFACE RESIDUE NUCLEATION DUE TO ANHYDROUS HF/METHANOL VAPOR PHASE CLEANING Carter, R.J., Hauser, J.R., Nemanich, R.J. Electrochemical Society	10 国際会議録 A Novel Concept for Contact Etch Residue Removal I.J. Vos, D. Hellin, S. Demuynck, O. Richard, T. Conard Electrochemical Society
5 国際会議録 The Removal of Reactive Ion Etch Residues Bohannon, Brynne K., Poarch, Scott, Syverson, Daniel J. Electrochemical Society	11 国際会議録 VAPOR PHASE HF CLEANING IN CMOS PRODUCTION O'Brien, S., Bohannon, B., Hoy Bennett, M., Tipton, C., Bowling, A. Electrochemical Society
6 国際会議録 VAPOR PHASE CLEANING OF POLYSILICON EMITTER AND TITANIUM SALICIDE STRUCTURES FOR 0.35 MICRON TECHNOLOGIES Bohannon, B., Witowski, B., Barnett, J., Syverson, D. Electrochemical Society	12 国際会議録 APPLICABILITY OF HF SOLUTIONS FOR CONTACT HOLE CLEANING ON TOP OF TiSi2 Baklanov, M., Kondoh, E., Vanhaelemeersch, S., Maex, K. Electrochemical Society

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