EVOLUTION OF Si SURFACES AFTER ANHYDROUS HF:CH3OH ETCHING

EVOLUTION OF Si SURFACES AFTER ANHYDROUS HF:CH3OH ETCHING

著者名:

掲載資料名:

Proceedings of the Fourth International Symposium on Cleaning Technology in Semiconductor Device Manufacturing

シリーズ名:

Electrochemical Society Proceedings Series

シリーズ巻号:

95-20

発行年:

1995

開始ページ:

208

終了ページ:

213

総ページ数:

6

出版情報:

Pennington, NJ: Electrochemical Society

ISSN:

01616374

ISBN:

9781566771153 [1566771153]

言語:

英語

請求記号:

E23400/962140

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00013825
シリーズID:	PA00000028
会議名:	International Symposium on Cleaning Technology in Semiconductor Device Manufacturing ; Fall Electrochemical Society Meeting
回次:	4th
会議開催地:	Chicago, Illinois, USA
会議開催年:	1995.10.00

類似資料:

1 国際会議録 SILICON SURFACES EXPOSED TO ANHYDROUS HF/CH3OH ETCHING Torek, K., Ruzyllo, J., Kamieniecki, E. Electrochemical Society	7 国際会議録 Gas Phase Conditioning of Silicon Surface after Reactive Ion Etching Hwang, D.K., Ruzyllo, J. Electrochemical Society
2 国際会議録 Anhydrous HF Processing as an Alternative to HF/Water Processes Staffa, J., Roman, P., Chang, K., Torek, K., Ruzyllo, J. MRS - Materials Research Society	8 国際会議録 Conditioning of Silicon Surface After RIE Using O2 and NF3 Remote Plasma Hwang, D.K., Ruzyllo, J., Grant, R. Electrochemical Society
3 国際会議録 Monitoring of HF/H2O Treated Silicon Surfaces Using Non-Contact Surface Charge Measurements Roman, P., Hwang, D., Torek, K., Ruzyllo, J., Kamieniecki, E. MRS - Materials Research Society	9 国際会議録 Silicon surface micromachining by anhydrous HF gas-phase etching with methanol Jang,W.I., Choi,C.A., Lee,C.S., Hong,Y.S., Lee,J.H., Baek,J.T., Kim,B.W. SPIE-The International Society for Optical Engineering
4 国際会議録 CLEANING OF SILICON SURFACE AFTER RIE USING UV/OZONE AND HF/CH3OH Hwang, D.K., Ruzyllo, J., Kamieniecki, E. Electrochemical Society	10 国際会議録 Dry release process of anhydrous HF gas-phase etching for the fabrication of a vibrating microgyroscope Jang,W.I., Choi,C.A., Hong,Y.S., Jun,C.H., Kim,Y.T., Lee,J.H. SPIE - The International Society for Optical Engineering
5 国際会議録 MONITORING OF SILICON SURFACE AFTER REACTIVE ION ETCHING Hwang, D.K., Ruzyllo, J., Kamieniecki, E. Electrochemical Society	11 国際会議録 GAS-PHASE ETCHING OF SILICON OXiDE WITH ANHYDROUS HF AND ISOPROPANOL Butterbaugh, J.W., Hiatt, C.F., Gray, D.C. Electrochemical Society
6 国際会議録 REMOVAL OF Al FROM SILICON SURFACES USING UV/Cl2 Daffron, C., Torek, K., Ruzyllo, J., Kamieniecki, E. Electrochemical Society	12 国際会議録 Semiconductor Surface Cleaning and Conditioning Challenges Beyond Planar Silicon Technology J. Ruzyllo Electrochemical Society

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