THE EFFECTS OF REVERSING WAFER-SURFACE WETTING PROPERTIES OF SULFURIC ACID:HYDROGEN PEROXIDE WAFER-CLEANING SOLUTIONS
- 著者名:
- 掲載資料名:
- Proceedings of the Fourth International Symposium on Cleaning Technology in Semiconductor Device Manufacturing
- シリーズ名:
- Electrochemical Society Proceedings Series
- シリーズ巻号:
- 95-20
- 発行年:
- 1995
- 開始ページ:
- 60
- 終了ページ:
- 65
- 総ページ数:
- 6
- 出版情報:
- Pennington, NJ: Electrochemical Society
- ISSN:
- 01616374
- ISBN:
- 9781566771153 [1566771153]
- 言語:
- 英語
- 請求記号:
- E23400/962140
- 資料種別:
- 国際会議録
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6
国際会議録
ELECTROCHEMICAL EQUILIBRIUM OF Fe IN ACID/BASE/ PEROXIDE SOLUTIONS RELATED TO Si WAFER CLEANING
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