Quality innovation of SIMOX wafers by low dose and high temperature oxidation techniques

Quality innovation of SIMOX wafers by low dose and high temperature oxidation techniques

著者名:

Tachimori, M

掲載資料名:

Proceedings of the Seventh International Symposium on Silicon-on-Insulator Technology and Devices

シリーズ名:

Electrochemical Society Proceedings Series

シリーズ巻号:

96-3

発行年:

1995

開始ページ:

53

終了ページ:

62

出版情報:

Pennington, NJ: Electrochemical Society

ISSN:

01616374

ISBN:

9781566771535 [1566771536]

言語:

英語

請求記号:

E23400/962142

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00013813
シリーズID:	PA00000028
会議名:	International Symposium on Silicon-on-Insulator Technology and Devices ; Electrochemical Society Meeting
回次:	7th ; 187th
会議開催地:	Los Angeles, California, USA
会議開催年:	1996.05.05-1996.05.10

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2 国際会議録 Quality improvement of SIMOX wafers by utilIzing nitrogen-doped Cz Silicon crystal Kawaniura, K., Hamaguchi, I., Sasaki, T., Takayania, S., Nagatake, Y., Matsumura, A. Electrochemical Society	8 国際会議録 Ultra thin buried oxide layers formed by low dose SIMOX processes Aspar, B., Pudda, C., Papon, A.M., Auberton-Herve, A.J., Lamure, J.M. Electrochemical Society
3 国際会議録 Effect of oxidising ambient on the buried oxide synthesis in low-dose SIMOX wafers Jablonski, J, Miyanuwa, Y, Mchedlid:e, T R, Saito, M, Katayama, T, Imai, M, Nakashima, S Electrochemical Society	9 国際会議録 Low-dose SIMOX approach and characteristics Litoechenko, V, Romanyk, B, Efremov, A, Klyui, M, Mel'nik, V P Electrochemical Society
4 国際会議録 High Performance Silicon Wafer with Wide Grown-in Void Free Zone and High Density Internal Gettering Site Achieved via Rapid Crystal Growth with Nitrogen Doping … Tamatsuka, M., Kobayashi, N., Tobe, S., Masui, T. Electrochemical Society	10 国際会議録 Effect of Oxygen Dose Variation on the SIMOX Microstructure Datta, R., Krishnamoorthy, V., Allen, L. P., Chandonnet, R., Farley, M., Jones, K. S. MRS - Materials Research Society
5 国際会議録 Photoluminescence Study on Point Defects in SIMOX Buried SiO2 Film Seol,K.S., Ieki,A., Ohki,Y., Nishikawa,H., Tachimori,M. Trans Tech Publications	11 国際会議録 Current Status of SIMOX Technolgoy - High-Quality ITOX-SIMOX Wafers and their Application to Quarter-Micron CMOS LSIs Izumi, K. Electrochemical Society
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