Blank Cover Image

Development of an ion implanter for SIMOX wafer volume production

著者名:
掲載資料名:
Proceedings of the Seventh International Symposium on Silicon-on-Insulator Technology and Devices
シリーズ名:
Electrochemical Society Proceedings Series
シリーズ巻号:
96-3
発行年:
1995
開始ページ:
28
終了ページ:
33
出版情報:
Pennington, NJ: Electrochemical Society
ISSN:
01616374
ISBN:
9781566771535 [1566771536]
言語:
英語
請求記号:
E23400/962142
資料種別:
国際会議録

類似資料:

1 国際会議録 Microwave ion source for next generation SIMOX ion implanter

Tokiguchi, K., Seki, T., Amemiya, K., Arimatsu, K., Hashimoto, I.

Electrochemical Society
7 国際会議録 NITROGEN CONTAMINATION IN SIMOX WAFER

Davis, G. E., Jones, K. S., Prussin, S.

Materials Research Society
2 国際会議録 Screening SIMOX wafers' background doping for SOI CMOS SRAM production

Yue, J., Liou, H.K., Liu, S.T.

Electrochemical Society
8 国際会議録 Development of Cube Texture during Industrial Processing of High Purity Aluminum Foil Obtained with 99% Volume Fraction of Cube Component

Kajihara, K., Tokuda, K., Sugizaki, Y., Seki, Y.

Trans Tech Publications
3 国際会議録 Depth-based selective image reconstruction using spatiotemporal image analysis

Haga,T., Sumi,K., Hashimoto,M., Seki,A.

SPIE - The International Society for Optical Engineering
9 国際会議録 ION IMPLANTATION DOPING OF SIMOX WITH 31P AND 69Ga

Jones, K..S., Venables, D., Horne, C.r., Davis, G.

Materials Research Society
4 国際会議録 Characterization of Impurities in Si(C2H50)4 for Efficient SiO2 Production in ULSI Technology

Danno,T., Seki,K.

Trans Tech Publications
10 国際会議録 IN-SITU TEM OBSERVATION OF DEFECTS AND AMORPHOUS PHASE IN Si WAFER DURING ION IMPLANTATION

Shigenaka, Naoto, Hashimoto, Tuneyuki, Fuse, Motomasa, Owada, Nobuo, Yamaguchi, Hizuru, Ozono, Seiko

Materials Research Society
5 国際会議録 Development and Investigation on ERAS-100 of 100 mm Diameter Wafer for 4H-SiC Post Ion Implantation Annealing

Shibagaki, M., Satoh, M, Kurematsu, Y., Numajiri, K., Watanabe, F., Haga, S., Miura, K., Suzuki, T., Miyagawa, S.

Trans Tech Publications
11 国際会議録 Evaluation of defects in surface Si near Si/BOX interface in SIMOX wafers

Sudou, M., Kainuma, M., Nakai, T., Tomizawa, K.

Electrochemical Society
6 国際会議録 FORMATION OF Au COLLOID PARTICLES IN SILICA GLASS BY ION IMPLANTATION

Fukumi, K., Chayahara, A., Adachi, M., Kadono, K., Sakaguchi, T., Miya, M., Horino, Y., Kitamura, N., Hayakawa, J., …

Materials Research Society
12 国際会議録 Quality improvement of SIMOX wafers by utilIzing nitrogen-doped Cz Silicon crystal

Kawaniura, K., Hamaguchi, I., Sasaki, T., Takayania, S., Nagatake, Y., Matsumura, A.

Electrochemical Society
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12