Blank Cover Image

Measurement of Silicon Particles by Laser Surface Scanning and 365 Angle-Resolved Light Scattering

著者名:
Huff, H.R.
Goodall, R.K.
Williams, E.
Woo, K-S.
Liu, B.Y.H.
Warner, T.
Hirleman, D.
Gildersleeve, K.
Bullis, W.M.
Seheer, B.W.
Stover, J.
さらに 6 件
掲載資料名:
ULSI science and technology, 1995 : proceedings of the Fifth International Symposium on Ultra Large Scale Integration Science and Technology
シリーズ名:
Electrochemical Society Proceedings Series
シリーズ巻号:
95-5
発行年:
1995
開始ページ:
365
終了ページ:
383
出版情報:
Pennington, NJ: Electrochemical Society
ISSN:
01616374
ISBN:
9781566770996 [1566770998]
言語:
英語
請求記号:
E23400/952065
資料種別:
国際会議録

類似資料:

1 国際会議録 Wafer flatness modeling for scanning steppers

Goodall,R.K., Huff,H.R.

SPIE-The International Society for Optical Engineering
7 国際会議録 Prediction of light scattering characteristics of particles and structures on surfaces by the coupled-dipole method

Nebeker,B.M., Schmehl,R., Starr,G.W., Hirleman,E.D.

SPIE-The International Society for Optical Engineering
2 国際会議録 Interpretation of Carrier Recombination Lifetime and Diffusion Length Measurements in Silicon

Bullis, W.M., Huff, H.R.

Electrochemical Society
8 国際会議録 Modeling of light scattering from structures with particle contaminants

Nebeker,B.M., Starr,G.W., Hirleman,E.D.

SPIE-The International Society for Optical Engineering
3 国際会議録 Selection of calibration particles for scanning surface inspection systems

Mulholland,G.W., Bryner,N., Liggett,W., Scheer,B.W., Goodall,R.K.

SPIE-The International Society for Optical Engineering
9 国際会議録 Light scattering from patterned surfaces and particles on surfaces

Nebeker,B.M., Starr,G.W., Hirleman,E.D.

SPIE-The International Society for Optical Engineering
4 国際会議録 Silicon Wafer Thermal Processing: 300 mm Issues

Huff, H.R., Goodall, R.K., Griffiths, S.K., Nilson, R.H.

Electrochemical Society
10 国際会議録 Contamination control in semiconductor manufacturing and particle deposition on wafer surfaces

Liu,B.Y.H.

SPIE-The International Society for Optical Engineering
5 国際会議録 CHARACTERIZATION OF 300 mm SILICON POLISHED WAFERS

Au, C., Messina, T., Goodall, R.K., Huff, H.R.

Electrochemical Society
11 国際会議録 Automated classification and recognition of bacterial particles in flow by multi-angle scatter measurement and a support-vector machine classifier

B. Rajwa, M. Venkatapathi, K. Ragheb, P. P. Banada, E. D. Hirleman, T. Lary, J. P. Robinson

SPIE - The International Society of Optical Engineering
6 国際会議録 Oxygen Precipitation Behaviour in 300 mm Polished Czochralski Silicon Wafers

Ono, T., Rozgonyi, G.A., Au, C., Messina, T., Goodall, R.K., Huff, H.R.

Electrochemical Society
12 国際会議録 Non-parametric error estimation techniques applied to MSTAR data sets

Mehra, R.K., Huff, M., Ravichandran, B., Williams, A.

SPIE
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12