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Influence Of Vacuum Annealing on Native Si Point Defects

著者名:
Gossmann, H.-J.
Mogi, T.K.
Rafferty, C.S.
Stolk, P.A.
Eaglesham, D.J.
Luftman, H.S.
Unterwald, F.C.
Boone, T.
Thompson, M.O.
Poate, J.M.
さらに 5 件
掲載資料名:
ULSI science and technology, 1995 : proceedings of the Fifth International Symposium on Ultra Large Scale Integration Science and Technology
シリーズ名:
Electrochemical Society Proceedings Series
シリーズ巻号:
95-5
発行年:
1995
開始ページ:
177
終了ページ:
186
総ページ数:
10
出版情報:
Pennington, NJ: Electrochemical Society
ISSN:
01616374
ISBN:
9781566770996 [1566770998]
言語:
英語
請求記号:
E23400/952065
資料種別:
国際会議録

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