A 0.25mm MOSFET Technology Using In-Situ Rapid Thermal Gate Dielectrics
- 著者名:
- 掲載資料名:
- ULSI science and technology, 1995 : proceedings of the Fifth International Symposium on Ultra Large Scale Integration Science and Technology
- シリーズ名:
- Electrochemical Society Proceedings Series
- シリーズ巻号:
- 95-5
- 発行年:
- 1995
- 開始ページ:
- 68
- 終了ページ:
- 79
- 出版情報:
- Pennington, NJ: Electrochemical Society
- ISSN:
- 01616374
- ISBN:
- 9781566770996 [1566770998]
- 言語:
- 英語
- 請求記号:
- E23400/952065
- 資料種別:
- 国際会議録
類似資料:
1
国際会議録
Parasitic Resistance Considerations of Using Elevated Source/Drain for Sub-0.25 μm MOSFET Technology
Electrochemical Society |
Electrochemical Society |
2
国際会議録
Evaluation and Comparison of 3.0nm Gate-Stack Dielectrics for Tenth-Micron Technology NMOSFETs
MRS - Materials Research Society |
MRS - Materials Research Society |
3
国際会議録
Response-surface-based optimization of 0.1-ヲフm PMOSFETs with ultrathin gate stack dielectrics
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
4
国際会議録
Evaluation of Ultra-Thin Gate Evaluation of Ultra-Thin Gate Stack Dielectrics for 0.1 jim PMOSFETs
Electrochemical Society |
Electrochemical Society |
Electrochemical Society |
Materials Research Society |
6
国際会議録
Dual Salicide and Self-aligned Metal Gate Formation for Sub-0.25μm CMOS Technologies Using CMP
Electrochemical Society |
Materials Research Society |