Modeling and Simulation of Two-Dimensional Reactive Plasma Flow in Inductively Coupled Reactors

Modeling and Simulation of Two-Dimensional Reactive Plasma Flow in Inductively Coupled Reactors

著者名:

掲載資料名:

Proceedings of the Symposium on Process control, Diagnostics, and Modeling in Semiconductor Manufacturing

シリーズ名:

Electrochemical Society Proceedings Series

シリーズ巻号:

95-2

発行年:

1995

開始ページ:

588

終了ページ:

595

総ページ数:

8

出版情報:

Pennington, NJ: Electrochemical Society

ISSN:

01616374

ISBN:

9781566770965 [1566770963]

言語:

英語

請求記号:

E23400/952062

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00013808
シリーズID:	PA00000028
会議名:	Symposium on Process Control, Diagnostics, and Modeling in Semiconductor Manufacturing ; Meeting of the Electrochemical Society
回次:	1st ; 187th
会議開催地:	Reno, NV, USA
会議開催年:	195.05.21-1995.05.26

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