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Normal Incidence Reflectance: A Robust Tool for In Situ Real-Time Measurement of Growth Rates and Optical Constants of CVD-Grown Semiconductor Thin Films

著者名:
掲載資料名:
Proceedings of the Symposium on Process control, Diagnostics, and Modeling in Semiconductor Manufacturing
シリーズ名:
Electrochemical Society Proceedings Series
シリーズ巻号:
95-2
発行年:
1995
開始ページ:
261
終了ページ:
269
総ページ数:
9
出版情報:
Pennington, NJ: Electrochemical Society
ISSN:
01616374
ISBN:
9781566770965 [1566770963]
言語:
英語
請求記号:
E23400/952062
資料種別:
国際会議録

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