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Optimization of the chromium-shielding attenuated phase shift mask for 157-nm lithography

著者名:
  • Kurose, E. ( Semiconductor Leading Edge Technologies, Inc. (Japan) )
  • Watanabe, K. ( Semiconductor Leading Edge Technologies, Inc. (Japan) )
  • Suganaga, T. ( Semiconductor Leading Edge Technologies, Inc. (Japan) )
  • Itani, T. ( Semiconductor Leading Edge Technologies, Inc. (Japan) )
  • Fujii, K. ( Semiconductor Leading Edge Technologies, Inc. (Japan) )
掲載資料名:
Photomask and Next-Generation Lithography Mask Technology XI
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
5446
発行年:
2004
開始ページ:
603
終了ページ:
614
総ページ数:
12
出版情報:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819453693 [0819453692]
言語:
英語
請求記号:
P63600/5446.2
資料種別:
国際会議録

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