Optimization of the chromium-shielding attenuated phase shift mask for 157-nm lithography
- 著者名:
- Kurose, E. ( Semiconductor Leading Edge Technologies, Inc. (Japan) )
- Watanabe, K. ( Semiconductor Leading Edge Technologies, Inc. (Japan) )
- Suganaga, T. ( Semiconductor Leading Edge Technologies, Inc. (Japan) )
- Itani, T. ( Semiconductor Leading Edge Technologies, Inc. (Japan) )
- Fujii, K. ( Semiconductor Leading Edge Technologies, Inc. (Japan) )
- 掲載資料名:
- Photomask and Next-Generation Lithography Mask Technology XI
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 5446
- 発行年:
- 2004
- 開始ページ:
- 603
- 終了ページ:
- 614
- 総ページ数:
- 12
- 出版情報:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819453693 [0819453692]
- 言語:
- 英語
- 請求記号:
- P63600/5446.2
- 資料種別:
- 国際会議録
類似資料:
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2
国際会議録
Impact of attenuated phase-shifting mask for 157-nm lithography with high numerical aperture lens
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
3
国際会議録
Sub-70-nm pattern fabrication using an alternating phase-shifting mask in 157-nm lithography
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |