Through-pitch low-k1 contact hole imaging with CPL technology

Through-pitch low-k1 contact hole imaging with CPL technology

著者名:

Wiaux, V. ( IMEC (Belgium) )

Bekaert, J. ( IMEC (Belgium) )

Chen, J.F. ( ASML MaskTools, Inc. (USA) )

Hsu, S.D. ( ASML MaskTools, Inc. (USA) )

Ronse, K.G. ( IMEC (Belgium) )

Socha, R.J. ( ASML Technology Development Ctr. (USA) )

Vandenberghe, G. ( IMEC (Belgium) )

Van Den Broeke, D.J. ( ASML MaskTools, Inc. (USA) )

さらに 3 件

掲載資料名:

Photomask and Next-Generation Lithography Mask Technology XI

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

5446

発行年:

2004

開始ページ:

585

終了ページ:

594

総ページ数:

10

出版情報:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819453693 [0819453692]

言語:

英語

請求記号:

P63600/5446.2

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00013799
シリーズID:	PA00000029
会議名:	Photomask and Next-Generation Lithography Mask Technology
回次:	2004 : 11th
会議開催地:	Yokohama, Japan
会議開催年:	2004.04.14-2004.04.16

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