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Contact hole reticle optimization by using interference mapping lithography (IML)

著者名:
Socha, R.J. ( ASML MaskTools, Inc. (USA) )
Van Den Broeke, D.J. ( ASML MaskTools, Inc. (USA) )
Hsu, S.D. ( ASML MaskTools, Inc. (USA) )
Chen, J.F. ( ASML MaskTools, Inc. (USA) )
Laidig, T.L. ( ASML MaskTools, Inc. (USA) )
Corcoran, N.P. ( ASML MaskTools, Inc. (USA) )
Hollerbach, U. ( ASML MaskTools, Inc. (USA) )
Wampler, K.E. ( ASML MaskTools, Inc. (USA) )
Shi, X. ( ASML MaskTools, Inc. (USA) )
Conley, W.E. ( Motorola, Inc. (USA) )
さらに 5 件
掲載資料名:
Photomask and Next-Generation Lithography Mask Technology XI
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
5446
発行年:
2004
開始ページ:
516
終了ページ:
534
総ページ数:
19
出版情報:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819453693 [0819453692]
言語:
英語
請求記号:
P63600/5446.2
資料種別:
国際会議録

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