Demonstration of damage-free mask repair using electron beam-induced processes
- 著者名:
Liang, T. ( Intel Corp. (USA) ) Stivers, A.R. ( Intel Corp. (USA) ) Penn, M. ( Intel Corp. (USA) ) Bald, D. ( Intel Corp. (USA) ) Sethi, C. ( Intel Corp. (USA) ) Boegli, V. ( NaWoTec GmbH (Germany) ) Budach, M. ( NaWoTec GmbH (Germany) ) Edinger, K. ( NaWoTec GmbH (Germany) ) Spies, P. ( NaWoTec GmbH (Germany) ) - 掲載資料名:
- Photomask and Next-Generation Lithography Mask Technology XI
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 5446
- 発行年:
- 2004
- 開始ページ:
- 291
- 終了ページ:
- 300
- 総ページ数:
- 10
- 出版情報:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819453693 [0819453692]
- 言語:
- 英語
- 請求記号:
- P63600/5446.1
- 資料種別:
- 国際会議録
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Performance results from the Zeiss/NaWoTec MeRit MG electron beam mask repair tool [5853-129]
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