Etching mechanism of Au thin films in Cl2/Ar inductively coupled plasma

Etching mechanism of Au thin films in Cl2/Ar inductively coupled plasma

著者名:

Efremov, A. ( Ivanovo State Univ. of Chemistry and Technology (Russia) and Chung-Ang Univ. (South Korea) )
Svettsov, V. ( Ivanovo State Univ. of Chemistry and Technology (Russia) )
Kim, C.-I. ( Chung-Ang Univ. (South Korea) )

掲載資料名:

Micro- and Nanoelectronics 2003

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

5401

発行年:

2004

開始ページ:

72

終了ページ:

78

総ページ数:

7

出版情報:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819453242 [0819453242]

言語:

英語

請求記号:

P63600/5401

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00013753
シリーズID:	PA00000029
会議名:	Micro- and Nanoelectronics
回次:	2003
会議開催地:	Zvenigorod, Russia
会議開催年:	2003.10.06-2003.10.10

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