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Patterning sub-50-nm Fin-FET using KrF lithography tool

著者名:
Singh, N. ( Institute of Microelectronics (Singapore) )
Jagar, S. ( Institute of Microelectronics (Singapore) )
Mehta, S.S. ( Institute of Microelectronics (Singapore) )
Roy, M.M. ( Institute of Microelectronics (Singapore) )
Kumar, R. ( Institute of Microelectronics (Singapore) )
Balasubramanian, N. ( Institute of Microelectronics (Singapore) )
さらに 1 件
掲載資料名:
Design and process integration for microelectronic manufacturing II [sic] : 26-27 February 2004, Santa Clara, California, USA
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
5379
発行年:
2004
開始ページ:
260
終了ページ:
267
総ページ数:
8
出版情報:
Bellingham, Wash., USA: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819452924 [0819452920]
言語:
英語
請求記号:
P63600/5379
資料種別:
国際会議録

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