A 65-nm node SRAM solution using alt-PSM with ArF lithography

A 65-nm node SRAM solution using alt-PSM with ArF lithography

著者名:

Driessen, F.A. ( Synopsys, Roermond (Netherlands) )
Zawadzki, M.T. ( Cypress Semiconductor Corp. (USA) )
Krishnan, P.R. ( Cypress Semiconductor Corp. (USA) )
Balasinski, A. ( Cypress Semiconductor Corp. (USA) )
Vandenberghe, G. ( IMEC (Belgium) )

掲載資料名:

Design and process integration for microelectronic manufacturing II [sic] : 26-27 February 2004, Santa Clara, California, USA

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

5379

発行年:

2004

開始ページ:

224

終了ページ:

234

総ページ数:

11

出版情報:

Bellingham, Wash., USA: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819452924 [0819452920]

言語:

英語

請求記号:

P63600/5379

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00013731
シリーズID:	PA00000029
会議名:	SPIE Advanced Lithography : Design and process integration for microelectronic manufacturing
回次:	2004 : 2nd
会議開催地:	Santa Clara, CA, USA
会議開催年:	2004.02.26-2004.02.27

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1 国際会議録 Extending ArF to the 65-nm node with full-phase lithography Driessen, F.A., Pierrat, C., Vandenberghe, G., Ronse, K.G., Adrichem, P., Liu, H.-Y. SPIE-The International Society for Optical Engineering	7 国際会議録 Performance optimization of the double-exposure slternating PSM for (sub-) 100-nm ICs Vandenberghe,G.N., Driessen,F., Adrichem,P.J.van, Ronse,K., Li,J., Karklin,L. SPIE-The International Society for Optical Engineering
2 国際会議録 Full phase-shifting methodology for 65-nm node lithography Pierrat, C., Driessen, F.A.J.M., Vandenberghe, G. SPIE-The International Society for Optical Engineering	8 国際会議録 Lithography strategy for 65-nm node (Invited Paper) Borodovsky, Y.A., Schenker, R.E., Allen, G.A., Tejnil, E., Hwang, D.H., Lo, F.-C., Singh, V.K., Gleason, R.E., … SPIE-The International Society for Optical Engineering
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6 国際会議録 A 90-nm design-rule patterning application using alt-PSM with KrF lithography for volume manufacturing at k1=0.27 Majoni, S., Driessen, F.A., Kasprowicz, B.S., Harris, P.D. SPIE - The International Society of Optical Engineering	12 国際会議録 Phase defect printability and mask inspection capability of 65-nm technology node Alt-PSM for ArF lithography (Photomask Japan Best Paper) Akima, S., Komizo, T., Kawakita, S., Kodera, Y., Narita, T., Ishikawa, K. SPIE - The International Society of Optical Engineering

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