Extending aggressive low-k1 design rule requirements for 90-nm and 65-nm nodes via simultaneous optimization of NA, illumination, and OPC

Extending aggressive low-k1 design rule requirements for 90-nm and 65-nm nodes via simultaneous optimization of NA, illumination, and OPC

著者名:

Roy, S. ( ASML MaskTools, Inc. (USA) )

Van Den Broeke, D.J. ( ASML MaskTools, Inc. (USA) )

Chen, J.F. ( ASML MaskTools, Inc. (USA) )

Liebchen, A. ( ASML MaskTools, Inc. (USA) )

Chen, T. ( ASML MaskTools, Inc. (USA) )

Hsu, S.D. ( ASML MaskTools, Inc. (USA) )

Shi, X. ( ASML MaskTools, Inc. (USA) )

Socha, R.J. ( ASML TDC (USA) )

さらに 3 件

掲載資料名:

Design and process integration for microelectronic manufacturing II [sic] : 26-27 February 2004, Santa Clara, California, USA

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

5379

発行年:

2004

開始ページ:

190

終了ページ:

201

総ページ数:

12

出版情報:

Bellingham, Wash., USA: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819452924 [0819452920]

言語:

英語

請求記号:

P63600/5379

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00013731
シリーズID:	PA00000029
会議名:	SPIE Advanced Lithography : Design and process integration for microelectronic manufacturing
回次:	2004 : 2nd
会議開催地:	Santa Clara, CA, USA
会議開催年:	2004.02.26-2004.02.27

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1 国際会議録 Low k1 lithography patterning option for the 90-nm and 65-nm nodes Hsu, S.D., Van Den Broeke, D.J., Shi, X., Hsu, M., Wampler, K.E., Chen, J.F., Yu, A., Yang, S.C., Hsieh, F. SPIE-The International Society for Optical Engineering	7 国際会議録 Impact on OPC treatment accuracy due to illumination pupil shape deviation for 110-nm target CD Roy, S., Schlief, R.E., Hsu, S., Shi, X., Liebchen, A., Chen, J.F., Hansen, S.G. SPIE-The International Society for Optical Engineering
2 国際会議録 Full-chip manufacturing reliability check implementation for 90-nm and 65-nm nodes using CPL and DDL Hsu, M., Laidig, T.L., Wampler, K.E., Hsu, S.D., Shi, X., Chen, J.F., Van Den Broeke, D.J., Hsieh, F. SPIE - The International Society of Optical Engineering	8 国際会議録 Model-based scattering bars implementation for 65nm and 45nm nodes using IML technology [5853-50] Hsu, M., Van Den Broeke, D., Laidig, T., Wampler, K. E., Hollerbach, U., Socha, R., Chen, J. F., Hsu, S., Shi, X. SPIE - The International Society of Optical Engineering
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6 国際会議録 Extending KrF to 100-nm imaging with high-NA- and chromeless phase lithography technology Socha, R.J., Van Den Broeke, D.J., Yu, L., Conley, W., Wu, W., Chen, J.F., Petersen, J.S., Gerold, D.J., van Praagh, J., … SPIE-The International Society for Optical Engineering	12 国際会議録 Eigen-decomposition-based models for model OPC Shi, X., Laidig, T.L., Chen, J.F., Van Den Broeke, D.J., Hsu, S.D., Hsu, M., Wampler, K.E., Hollerbach, U. SPIE - The International Society of Optical Engineering

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