Integrated electrical and SEM-based defect characterization for rapid yield ramp

Integrated electrical and SEM-based defect characterization for rapid yield ramp

著者名:

Orbon, J. ( Applied Materials (USA) )

Levin, L. ( Applied Materials (USA) )

Bokobza, O. ( Applied Materials (USA) )

Shimshi, R. ( Applied Materials (USA) )

Dutta, M. ( Applied Materials (USA) )

Zhang, B. ( Applied Materials (USA) )

Ciplickas, D. ( PDF Solutions Inc. (USA) )

Pham, T. ( PDF Solutions Inc. (USA) )

Jensen, J. ( PDF Solutions Inc. (USA) )

さらに 4 件

掲載資料名:

Data analysis and modeling for process control : 26-27 February 2004, Santa Clara, California, USA

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

5378

発行年:

2004

開始ページ:

142

終了ページ:

150

総ページ数:

9

出版情報:

Bellingham, Wash., USA: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819452917 [0819452912]

言語:

英語

請求記号:

P63600/5378

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00013730
シリーズID:	PA00000029
会議名:	SPIE Advanced Lithography : Data analysis and modeling for process control
回次:	2004
会議開催地:	Santa Clara, CA, USA
会議開催年:	2004.02.26-2004.02.27

類似資料:

1 国際会議録 IC yield prediction and analysis using semi-empirical yield models and test data Ciplickas, D.J., Niewczas, M., Ruehl, R., Stine, B., Vallishayee, R.R., Wojciak, W. SPIE-The International Society for Optical Engineering	7 国際会議録 Integrated Yield Management Tobin,K.W., Kamowskit,T.P., Gleascn,S.S., Jensen,D., Lakhani,F. SPIE - The International Society for Optical Engineering
2 国際会議録 Immersion-induced defect SEM-based library for fast baseline improvement and excursion I. Englard, R. Stegen, E. V. Brederode, P. Vanoppen, I. Minnaert-Janssen, F. Duray, T. der Kinderen, G. Tanriseven, I. … SPIE - The International Society of Optical Engineering	8 国際会議録 Reticle defect printability: impact on yield and feedback to suppliers Vinle, R., Klaum, A.D., Chmielewski, D., Lamantia, M.J., Woolery, D.M., Coburn, D.L., Weins, C.P. SPIE-The International Society for Optical Engineering
3 国際会議録 Electrical characterization of defects introduced during plasma-based processing of GaAs Auret,F.D., Goodman,S.A., Myburg,G., Meyer,W.E., Deenapanray,P.N.K., Murtagh,M., Ye,S.-R., Masterson,H.J., … Trans Tech Publications	9 国際会議録 Fabrication of integrated circuits with high yield using ultra-thin resist processes Peters, R.D., Postnikov, S.V., Cobb, J.L., Dakshina-Murthy, S., Stephens, T., Parker, C., Luckowski, E., Martinez, A.M. … SPIE-The International Society for Optical Engineering
4 国際会議録 Electrical defect SEM review under the various electric circumstances on SAC layer Lee, T.Y., Whan, N.-K., Lee, B.H., Chin, S.-B., Cho, D.H., Choi, J.I., Hur, S.S., Ko, K.H., Yeo, J.-H. SPIE - The International Society of Optical Engineering	10 国際会議録 STRUCAL DEFECTS IN THIN FILMS OF HIGH TC SUPERCONDUCTORS Ramesh, R., Hwang, D.M., England, P., Ravi, T.S., Chen, C.Y., Inam, A., Dutta, B., Nazar, L., Venkatesan, T. Materials Research Society
5 国際会議録 Electrical Characterization of Defects Introduced During Plasma-Based Processing of GaAs Auret, F. D., Myburg, G., Meyer, W. E., Deenapanray, P. N. K., Nordhoff, H., Murtagh, M., Ye, Shu-Ren, Masterson, H. J., … MRS - Materials Research Society	11 国際会議録 RAPID EVALUATION OF THIN FILM INTERFACIAL REACTIONS USING TEMPERATURE-RAMPED MEASUREMENTS Harper, J. M. E., Clevenger, L. A., Colgan, E. G., Cabral, C., Jr., Arcot, B. MRS - Materials Research Society
6 国際会議録 Simulations of sample-up-the-ramp for space-based observations of faint sources D. J. Benford, T. R. Lauer, D. B. Mott Society of Photo-optical Instrumentation Engineers	12 国際会議録 Statistical measure for the sharpness of SEM images Zhang,N.F., Postek,M.T., Larrabee,R.D., Vladar,A.E., Keery,W.J., Jones,S.N. SPIE-The International Society for Optical Engineering

1

2

3

4

5

6

7

8

9

10

11

12