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Advanced module-based approach to effective CD prediction of sub-100nm patterns

著者名:
Shin, J. ( Samsung Electronics Co., Ltd. (South Korea) )
Kim, I. ( Samsung Electronics Co., Ltd. (South Korea) )
Hwang, C. ( Samsung Electronics Co., Ltd. (South Korea) )
Park, D.-W. ( Samsung Electronics Co., Ltd. (South Korea) )
Woo, S.-G. ( Samsung Electronics Co., Ltd. (South Korea) )
Cho, H.-K. ( Samsung Electronics Co., Ltd. (South Korea) )
Han, W.-S. ( Samsung Electronics Co., Ltd. (South Korea) )
Moon, J.-T. ( Samsung Electronics Co., Ltd. (South Korea) )
さらに 3 件
掲載資料名:
Data analysis and modeling for process control : 26-27 February 2004, Santa Clara, California, USA
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
5378
発行年:
2004
開始ページ:
65
終了ページ:
73
総ページ数:
9
出版情報:
Bellingham, Wash., USA: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819452917 [0819452912]
言語:
英語
請求記号:
P63600/5378
資料種別:
国際会議録

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