RET for optical maskless lithography

RET for optical maskless lithography

著者名:

Sandstrom, T. ( Micronic Laser Systems AB (Sweden) )
Martinsson, H. ( Micronic Laser Systems AB (Sweden) )

掲載資料名:

Optical Microlithography XVII

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

5377

発行年:

2004

開始ページ:

1750

終了ページ:

1763

総ページ数:

14

出版情報:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819452900 [0819452904]

言語:

英語

請求記号:

P63600/5377.3

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00013729
シリーズID:	PA00000029
会議名:	SPIE Advanced Lithography : Optical Microlithography
回次:	2004 : 17th
会議開催地:	Santa Clara, CA, USA
会議開催年:	2004.02.24-2004.02.27

類似資料:

1 国際会議録 Rasterizing for SLM-based mask making and maskless lithography Martinsson, H., Sandstrom, T. SPIE - The International Society of Optical Engineering	7 国際会議録 Maskless EUV lithography via optically addressed modulator Teramoto, Y., Sato, H., Bessho, K., Niimi, G., Shirai, T., Yamatani, D., Takemura, T., Yokoto, T., Paul, K. C., Kabuki, … SPIE - The International Society of Optical Engineering
2 国際会議録 Gray scaling in high performance mask making [5853-94] Martinsson, H., Sandstrom, T. SPIE - The International Society of Optical Engineering	8 国際会議録 Projection maskless lithography Brandstatter, C., Loeschner, H., Stengl, G., Lammer, G., Buschbeck, H., Platzgummer, E., Doring, H.-J., Elster, T., … SPIE - The International Society of Optical Engineering
3 国際会議録 Gray scaling in high performance optical pattern generators [5992-30] Martinsson, H., Sandstrom, T., Rockwell, B. SPIE - The International Society of Optical Engineering	9 国際会議録 Application of rigorous electromagnetic simulation to SLM-based maskless lithography for 65-nm node Croffie, E.H., Eib, N., Callan, N.P., Baba-Ali, N., Latypov, A., Hintersteiner, J., Sandstrom, T., Bleeker, A., … SPIE - The International Society of Optical Engineering
4 国際会議録 Phase-shifting optical maskless lithography enabling ASICs at the 65- and 45-nm nodes Sandstrom, T., Ljungblad, U. B. SPIE - The International Society of Optical Engineering	10 国際会議録 Printing sub-100-nm random logic patterns using binary masks and synthetic-aperture lithography (SAL) Sandstrom,T. SPIE-The International Society for Optical Engineering
5 国際会議録 OML: optical maskless lithography for economic design prototyping and small-volume production Sandstrom, T., Bleeker, A., Hintersteiner, J., Troost, K., Freyer, J., van der Mast, K. SPIE - The International Society of Optical Engineering	11 国際会議録 System considerations for maskless lithography Karnowski, T., Joy, D., Allard, L., Clonts, L. SPIE - The International Society of Optical Engineering
6 国際会議録 Transparent corner enhancement scheme for a DUV pattern generator Martinsson, H., Hellgren, J., Eriksson, N., Bjuggren, M., Sandstrom, T. SPIE-The International Society for Optical Engineering	12 国際会議録 RET masks for the final frontier of optical lithography [5853-104] Chen, J. F., Broeke, D. van den, Hsu, S., Hsu, M. C.W., Laidig, T., Shi, X., Chen, T., Socha, R. J., Hollerbach, U., … SPIE - The International Society of Optical Engineering

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