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Full-field imaging with a 157-nm scanner

著者名:
Robinson, C. ( IBM Microelectronics Div. (USA) )
Seong, N. ( IBM Microelectronics Div. (USA) )
Kimmel, K. ( IBM Microelectronics Div. (USA) )
Brunner, T.A. ( IBM Microelectronics Div. (USA) )
Hibbs, M. ( IBM Microelectronics Div. (USA) )
Lercel, M.J. ( IBM Microelectronics Div. (USA) )
McCafferty, D. ( ASML (USA) )
Sewell, H. ( ASML (USA) )
O'Neil, T.K. ( ASML (USA) )
Ivaldi, J. ( ASML (USA) )
Andresen, K. ( ASML (USA) )
さらに 6 件
掲載資料名:
Optical Microlithography XVII
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
5377
発行年:
2004
開始ページ:
1669
終了ページ:
1678
総ページ数:
10
出版情報:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819452900 [0819452904]
言語:
英語
請求記号:
P63600/5377.3
資料種別:
国際会議録

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1 国際会議録 Optical lithography with 157-nm technology

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7 国際会議録 Current status of 157-nm lithography using a full-field scanner

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