157-nm photoresist process optimization for a full-field scanner

157-nm photoresist process optimization for a full-field scanner

著者名:

Light, S. ( IMEC (Belgium) and IMEC (Belgium) )

Stepanenko, N. ( IMEC (Belgium) and IMEC vzw (Belgium) )

Gronheid, R. ( IMEC (Belgium) )

Van Roey, F. ( IMEC (Belgium) )

Van den Heuvel, D. ( IMEC (Belgium) )

Goethals, A.-M. ( IMEC (Belgium) )

さらに 1 件

掲載資料名:

Optical Microlithography XVII

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

5377

発行年:

2004

開始ページ:

1658

終了ページ:

1668

総ページ数:

11

出版情報:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819452900 [0819452904]

言語:

英語

請求記号:

P63600/5377.3

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00013729
シリーズID:	PA00000029
会議名:	SPIE Advanced Lithography : Optical Microlithography
回次:	2004 : 17th
会議開催地:	Santa Clara, CA, USA
会議開催年:	2004.02.24-2004.02.27

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