First results from AIMS beta tool for 157-nm lithography

First results from AIMS beta tool for 157-nm lithography

著者名:

Teuber, S. ( Advanced Mask Technology Ctr. (Germany) )

Higashikawa, I. ( Semiconductor Leading Edge Technologies, Inc. (Japan) )

Urbach, J.-P. ( International SEMATECH (USA) )

Schilz, C.M. ( Infineon Technologies AG (Germany) )

Koehle, R. ( Infineon Technologies AG (Germany) )

Zibold, A.M. ( Carl Zeiss (Germany) )

さらに 1 件

掲載資料名:

Optical Microlithography XVII

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

5377

発行年:

2004

開始ページ:

1648

終了ページ:

1657

総ページ数:

10

出版情報:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819452900 [0819452904]

言語:

英語

請求記号:

P63600/5377.3

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00013729
シリーズID:	PA00000029
会議名:	SPIE Advanced Lithography : Optical Microlithography
回次:	2004 : 17th
会議開催地:	Santa Clara, CA, USA
会議開催年:	2004.02.24-2004.02.27

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