A simple and accurate resist parameter extraction method for sub-80-nm DRAM patterns
- 著者名:
Lee, S. ( Samsung Electronics Co., Ltd. (South Korea) ) Hwang, C. ( Samsung Electronics Co., Ltd. (South Korea) ) Park, D.-W. ( Samsung Electronics Co., Ltd. (South Korea) ) Kim, I.-S. ( Samsung Electronics Co., Ltd. (South Korea) ) Kim, H.-C. ( Samsung Electronics Co., Ltd. (South Korea) ) Woo, S.-G. ( Samsung Electronics Co., Ltd. (South Korea) ) Cho, H.-K. ( Samsung Electronics Co., Ltd. (South Korea) ) Moon, J.-T. ( Samsung Electronics Co., Ltd. (South Korea) ) - 掲載資料名:
- Optical Microlithography XVII
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 5377
- 発行年:
- 2004
- 開始ページ:
- 1413
- 終了ページ:
- 1421
- 総ページ数:
- 9
- 出版情報:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819452900 [0819452904]
- 言語:
- 英語
- 請求記号:
- P63600/5377.3
- 資料種別:
- 国際会議録
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Successful application of angular scatterometry to process control in sub-100-nm DRAM device
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Effect of line-edge roughness (LER) and line-width roughness (LWR) on sub-100-nm device performance
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