Implementation of pattern-specific illumination pupil optimization on Step & Scan systems
- 著者名:
Engelen, A. ( ASML (Netherlands) ) Socha, R.J. ( ASML (USA) ) Hendrickx, E. ( IMEC (Belgium) ) Scheepers, W. ( ASML (Netherlands) ) Nowak, F. ( ASML (Netherlands) ) Van Dam, M. ( ASML (Netherlands) ) Liebchen, A. ( ASML (USA) ) Faas, D.A. ( ASML (Netherlands) ) - 掲載資料名:
- Optical Microlithography XVII
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 5377
- 発行年:
- 2004
- 開始ページ:
- 1323
- 終了ページ:
- 1333
- 総ページ数:
- 11
- 出版情報:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819452900 [0819452904]
- 言語:
- 英語
- 請求記号:
- P63600/5377.3
- 資料種別:
- 国際会議録
類似資料:
SPIE - The International Society of Optical Engineering |
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SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
4
国際会議録
Impact on OPC treatment accuracy due to illumination pupil shape deviation for 110-nm target CD
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |