Feasibility studies of ArF chromeless mask (CLM) for sub-80-nm era
- 著者名:
- Eom, T.-S. ( Hynix Semiconductor Inc. (South Korea) )
- Lim, C.-M. ( Hynix Semiconductor Inc. (South Korea) )
- Sung, M.G. ( Hynix Semiconductor Inc. (South Korea) )
- Moon, S.-C. ( Hynix Semiconductor Inc. (South Korea) )
- Shin, K.S. ( Hynix Semiconductor Inc. (South Korea) )
- 掲載資料名:
- Optical Microlithography XVII
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 5377
- 発行年:
- 2004
- 開始ページ:
- 1287
- 終了ページ:
- 1296
- 総ページ数:
- 10
- 出版情報:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819452900 [0819452904]
- 言語:
- 英語
- 請求記号:
- P63600/5377.2
- 資料種別:
- 国際会議録
類似資料:
1
国際会議録
Comparative study of chromeless and attenuated phase shift mask for 0.3-k1 ArF lithography of DRAM
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
10
国際会議録
Feasibility evaluations of alternating phase-shift mask for imaging sub-80nm feature with KrF
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |