Phenomena and OPC solution of ripple patterns for 65-nm node
- 著者名:
Lai, C.-M. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) ) Ho, J.-S. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) ) Lai, C.-W. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) ) Tsai, C.-K. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) ) Tsay, C.-S. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) ) Chen, J.-H. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) ) Liu, R.-G. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) ) Ku, Y.C. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) ) Lin, B.-J. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) ) - 掲載資料名:
- Optical Microlithography XVII
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 5377
- 発行年:
- 2004
- 開始ページ:
- 1165
- 終了ページ:
- 1171
- 総ページ数:
- 7
- 出版情報:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819452900 [0819452904]
- 言語:
- 英語
- 請求記号:
- P63600/5377.2
- 資料種別:
- 国際会議録
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6
国際会議録
Determination of mask induced polarization effects occurring in hyper NA immersion lithography
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |