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MEV as a new constraint for lithographers in the sub-100-nm regime

著者名:
Trouiller, Y. ( LETI-CEA (France) )
Postnikov, S.V. ( Motorola (France) )
Lucas, K.D. ( Motorola (France) )
Sundermann, F. ( STMicroelectronics (France) )
Patterson, K. ( Motorola (France) )
Belledent, J. ( Philips Semiconductors (France) )
Couderc, C. ( Philips Semiconductors (France) )
Rody, Y.F. ( Philips Semiconductors (France) )
さらに 3 件
掲載資料名:
Optical Microlithography XVII
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
5377
発行年:
2004
開始ページ:
1081
終了ページ:
1092
総ページ数:
12
出版情報:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819452900 [0819452904]
言語:
英語
請求記号:
P63600/5377.2
資料種別:
国際会議録

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