MEV as a new constraint for lithographers in the sub-100-nm regime
- 著者名:
Trouiller, Y. ( LETI-CEA (France) ) Postnikov, S.V. ( Motorola (France) ) Lucas, K.D. ( Motorola (France) ) Sundermann, F. ( STMicroelectronics (France) ) Patterson, K. ( Motorola (France) ) Belledent, J. ( Philips Semiconductors (France) ) Couderc, C. ( Philips Semiconductors (France) ) Rody, Y.F. ( Philips Semiconductors (France) ) - 掲載資料名:
- Optical Microlithography XVII
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 5377
- 発行年:
- 2004
- 開始ページ:
- 1081
- 終了ページ:
- 1092
- 総ページ数:
- 12
- 出版情報:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819452900 [0819452904]
- 言語:
- 英語
- 請求記号:
- P63600/5377.2
- 資料種別:
- 国際会議録
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