BEOL lithography for early development at the 65-nm node
- 著者名:
DellaGuardia, R. ( IBM Microelectronics Div. (USA) ) Kwong, R.W. ( IBM Microelectronics Div. (USA) ) Li, W. ( IBM Microelectronics Div. (USA) ) Lawson, P. ( IBM Microelectronics Div. (USA) ) Burkhardt, M. ( IBM Microelectronics Div. (USA) ) Grauer, I.C. ( IBM Microelectronics Div. (USA) ) Wu, Q. ( IBM Microelectronics Div. (USA) ) Angyal, M. ( IBM Microelectronics Div. (USA) ) Hichri, H. ( IBM Microelectronics Div. (USA) ) Melville, I. ( IBM Microelectronics Div. (USA) ) Kumar, K. ( IBM Microelectronics Div. (USA) ) Lin, Y. ( IBM Microelectronics Div. (USA) ) Holmes, S.J. ( IBM Microelectronics Div. (USA) ) Varanasi, R. ( IBM Microelectronics Div. (USA) ) Spooner, T. ( IBM Microelectronics Div. (USA) ) McHerron, D. ( IBM Microelectronics Div. (USA) ) - 掲載資料名:
- Optical Microlithography XVII
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 5377
- 発行年:
- 2004
- 開始ページ:
- 980
- 終了ページ:
- 987
- 総ページ数:
- 8
- 出版情報:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819452900 [0819452904]
- 言語:
- 英語
- 請求記号:
- P63600/5377.2
- 資料種別:
- 国際会議録
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7
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Highly etch-selective spin-on bottom antireflective coating for use in 193-nm lithography and beyond
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