The study of contact hole MEEF and defect printability
- 著者名:
Jeong, C.-Y. ( Hynix Semiconductor Inc. (South Korea) ) Lim, Y.H. ( Hynix Semiconductor Inc. (South Korea) ) Kim, H.I. ( Hynix Semiconductor Inc. (South Korea) ) Park, J.L. ( Hynix Semiconductor Inc. (South Korea) ) Choi, J.S. ( Hynix Semiconductor Inc. (South Korea) ) Lee, J.G. ( Hynix Semiconductor Inc. (South Korea) ) - 掲載資料名:
- Optical Microlithography XVII
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 5377
- 発行年:
- 2004
- 開始ページ:
- 930
- 終了ページ:
- 938
- 総ページ数:
- 9
- 出版情報:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819452900 [0819452904]
- 言語:
- 英語
- 請求記号:
- P63600/5377.2
- 資料種別:
- 国際会議録
類似資料:
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
2
国際会議録
Evaluation of litho printability of DRAM contact hole patterns with various programmed defects
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
9
国際会議録
KrF attenuated PSM defect printability and detectability for 120-nm actual DRAM patterning process
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
11
国際会議録
Comparative evaluation of mask production CAR development processes with stepwise defect inspection
SPIE-The International Society for Optical Engineering |
Society of Photo-optical Instrumentation Engineers |
SPIE-The International Society for Optical Engineering |