OML: optical maskless lithography for economic design prototyping and small-volume production

OML: optical maskless lithography for economic design prototyping and small-volume production

著者名:

Sandstrom, T. ( Micronic Laser Systems AB (Sweden) )

Bleeker, A. ( ASML (Netherlands) )

Hintersteiner, J. ( ASML (Netherlands) )

Troost, K. ( ASML (Netherlands) )

Freyer, J. ( Micronic Laser Systems Inc. (Sweden) )

van der Mast, K. ( ASML (Netherlands) )

さらに 1 件

掲載資料名:

Optical Microlithography XVII

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

5377

発行年:

2004

開始ページ:

777

終了ページ:

787

総ページ数:

11

出版情報:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819452900 [0819452904]

言語:

英語

請求記号:

P63600/5377.2

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00013728
シリーズID:	PA00000029
会議名:	SPIE Advanced Lithography : Optical Microlithography
回次:	2004 : 17th
会議開催地:	Santa Clara, CA, USA
会議開催年:	2004.02.24-2004.02.27

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