Simulation-based critical-area extraction and litho-friendly layout design for low-k1 lithography
- 著者名:
Choi, S.-H. ( Samsung Electronics Co., Ltd. (South Korea) ) Ban, Y.-C. ( Samsung Electronics Co., Ltd. (South Korea) ) Lee, K.-H. ( Samsung Electronics Co., Ltd. (South Korea) ) Kim, D.-H. ( Samsung Electronics Co., Ltd. (South Korea) ) Hong, J.-S. ( Samsung Electronics Co., Ltd. (South Korea) ) Kim, Y.-H. ( Samsung Electronics Co., Ltd. (South Korea) ) Yoo, M.-H. ( Samsung Electronics Co., Ltd. (South Korea) ) Kong, J.-T. ( Samsung Electronics Co., Ltd. (South Korea) ) - 掲載資料名:
- Optical Microlithography XVII
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 5377
- 発行年:
- 2004
- 開始ページ:
- 713
- 終了ページ:
- 720
- 総ページ数:
- 8
- 出版情報:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819452900 [0819452904]
- 言語:
- 英語
- 請求記号:
- P63600/5377.2
- 資料種別:
- 国際会議録
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