Experimental investigation of fabrication process-, transportation-, storage, and handling-induced contamination of 157-nm reticles and vacuum UV cleaning
- 著者名:
Okoroanyanwu, U. ( Advanced Micro Devices, Inc. (USA) and IMEC (Belgium) ) Stepanenko, N. ( Infineon Technologies AG (Germany) and IMEC (Belgium) ) Vereecke, G. ( IMEC (Belgium) ) Eliat, A. ( IMEC (Belgium) ) Kocsis, M.K. ( IMEC (Belgium) and Intel Corp. (USA) ) Kang, Y.S. ( IMEC (Belgium) and Samsung Electronics (South Korea) ) Jonckheere, R.M. ( IMEC (Belgium) ) Conard, T. ( IMEC (Belgium) ) Ronse, K.G. ( IMEC (Belgium) ) - 掲載資料名:
- Optical Microlithography XVII
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 5377
- 発行年:
- 2004
- 開始ページ:
- 487
- 終了ページ:
- 503
- 総ページ数:
- 17
- 出版情報:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819452900 [0819452904]
- 言語:
- 英語
- 請求記号:
- P63600/5377.1
- 資料種別:
- 国際会議録
類似資料:
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
11
国際会議録
Assessment of EUV reticle blank availability enabling the use of EUV tools today and in the future
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |