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Hard phase-shifting masks for the 65-nm node: a performance comparison

著者名:
Pforr, R. ( Infineon Technologies AG (Germany) )
Hennig, M. ( Infineon Technologies AG (Germany) )
Koehle, R. ( Infineon Technologies AG (Germany) )
Morgana, N. ( Infineon Technologies AG (Germany) )
Thiele, J. ( Infineon Technologies AG (Germany) )
Weckesser, J. ( Infineon Technologies AG (Germany) )
さらに 1 件
掲載資料名:
Optical Microlithography XVII
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
5377
発行年:
2004
開始ページ:
212
終了ページ:
221
総ページ数:
10
出版情報:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819452900 [0819452904]
言語:
英語
請求記号:
P63600/5377.1
資料種別:
国際会議録

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