New paradigm in lens metrology for lithographic scanner: evaluation and exploration

New paradigm in lens metrology for lithographic scanner: evaluation and exploration

著者名:

Lai, K. ( IBM Microelectronics Div. (USA) )

Gallatin, G.M. ( IBM Microelectronics Div. (USA) )

van de Kerkhof, M.A. ( ASML (Netherlands) )

Boeij, Wim de ( ASML (Netherlands) )

Kok, H. ( ASML (Netherlands) )

Schriever, M. ( Carl Zeiss (Germany) )

Morillo, J.D. ( IBM Microelectronics Div. (USA) )

Fair, R.H. ( IBM Microelectronics Div. (USA) )

Bennett, S. ( ASML (Netherlands) )

Corliss, D.A. ( IBM Microelectronics Div. (USA) )

さらに 5 件

掲載資料名:

Optical Microlithography XVII

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

5377

発行年:

2004

開始ページ:

160

終了ページ:

171

総ページ数:

12

出版情報:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819452900 [0819452904]

言語:

英語

請求記号:

P63600/5377.1

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00013727
シリーズID:	PA00000029
会議名:	SPIE Advanced Lithography : Optical Microlithography
回次:	2004 : 17th
会議開催地:	Santa Clara, CA, USA
会議開催年:	2004.02.24-2004.02.27

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