157-nm lithography with extremely high numerical aperture lens for 45-nm technology node

157-nm lithography with extremely high numerical aperture lens for 45-nm technology node

著者名:

Suganaga, T. ( Semiconductor Leading Edge Technologies, Inc. (Japan) )

Lee, J.-W. ( Semiconductor Leading Edge Technologies, Inc. (Japan) )

Kurose, E. ( Semiconductor Leading Edge Technologies, Inc. (Japan) )

Ishimaru, T. ( Semiconductor Leading Edge Technologies, Inc. (Japan) )

Furukawa, T. ( Semiconductor Leading Edge Technologies, Inc. (Japan) )

Itani, T. ( NEC Electronics Corp. (Japan) )

Fujii, K. ( Semiconductor Leading Edge Technologies, Inc. (Japan) )

Cashmore, J.S. ( Exitech Ltd. (United Kingdom) )

Gower, M. ( Exitech Ltd. (United Kingdom) )

さらに 4 件

掲載資料名:

Optical Microlithography XVII

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

5377

発行年:

2004

開始ページ:

104

終了ページ:

115

総ページ数:

12

出版情報:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819452900 [0819452904]

言語:

英語

請求記号:

P63600/5377.1

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00013727
シリーズID:	PA00000029
会議名:	SPIE Advanced Lithography : Optical Microlithography
回次:	2004 : 17th
会議開催地:	Santa Clara, CA, USA
会議開催年:	2004.02.24-2004.02.27

類似資料:

1 国際会議録 157-nm lithography with high numerical aperture lens for 70-nm technology node Suganaga, T., Kanda, N., Kim, J.-H., Yamabe, O., Watanabe, K., Furukawa, T., Miyoshi, S., Itani, T., Cashmore, J.S., … SPIE-The International Society for Optical Engineering	7 国際会議録 Optimization of the chromium-shielding attenuated phase shift mask for 157-nm lithography Kurose, E., Watanabe, K., Suganaga, T., Itani, T., Fujii, K. SPIE - The International Society of Optical Engineering
2 国際会議録 Wavefront aberration measurement in 157-nm high numerical aperture lens Kim, J.-H., Suganaga, T., Watanabe, K., Kanda, N., Itani, T., Cashmore, J.S., Gower, M.C. SPIE-The International Society for Optical Engineering	8 国際会議録 Control of side-lobe intensity for attenuated phase-shifting mask in 157-nm lithography Watanabe, K., Kurose, E., Suganaga, T., Itani, T. SPIE-The International Society for Optical Engineering
3 国際会議録 Impact of attenuated phase-shifting mask for 157-nm lithography with high numerical aperture lens Watanabe, K., Kurose, E., Suganaga, T., Itani, T. SPIE-The International Society for Optical Engineering	9 国際会議録 Advances in resist pattern transfer process using 157-nm lithography Furukawa, T., Hagiwara, T., Kawaguchi, E., Matsunaga, K., Suganaga, T., Itani, T., Fujii, K. SPIE - The International Society of Optical Engineering
4 国際会議録 157-nm lithography for 65-nm node SRAM-gate Suganaga, T., Irie, S., Miyoshi, S., Kim, J.-H., Watanabe, K., Kurose, E., Furukawa, T., Hagiwara, T., Ishimaru, T., … SPIE-The International Society for Optical Engineering	10 国際会議録 157-nm resist assessment by a full-field scanner Otoguro, A., Irie, S., Ishimaru, T., Suganaga, T., Itani, T., Fujii, K. SPIE - The International Society of Optical Engineering
5 国際会議録 157-nm chromeless phase lithography with extremely high numerical aperture Watanabe, K., Hagiwara, T., Matsuura, S., Suganaga, T., Itani, T., Fujii, K. SPIE - The International Society of Optical Engineering	11 国際会議録 Airborne contamination control for 157-nm lithography: influence of ammonia contamination Matsui, H., Kitano, J., Yoshihara, K., Kawaguchi, E., Furukawa, T., Matsunaga, K., Itani, T., Fujii, K. SPIE - The International Society of Optical Engineering
6 国際会議録 157-nm chromeless phase lithography for 45-nm SRAM gate Suganaga, T., Watanabe, K., Matsuura, S., Hagiwara, T., Furukawa, T., Itani, T., Fujii, K. SPIE - The International Society of Optical Engineering	12 国際会議録 High-resolution 157-nm imaging for lithography and micromachining applications Gower,M.C., Cashmore,J.S., Whitfield,M.D., Grunewald,P. SPIE-The International Society for Optical Engineering

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