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Novel rinse process for reducing pattern collapse in 0.30-k1 ArF lithography

著者名:
Lee, G. ( Hynix Semiconductor Inc. (South Korea) )
Hwang, Y.S. ( Hynix Semiconductor Inc. (South Korea) )
Ban, K.D. ( Hynix Semiconductor Inc. (South Korea) )
Bok, C.K. ( Hynix Semiconductor Inc. (South Korea) )
Moon, S.C. ( Hynix Semiconductor Inc. (South Korea) )
Shin, K.S. ( Hynix Semiconductor Inc. (South Korea) )
さらに 1 件
掲載資料名:
Advances in Resist Technology and Processing XXI
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
5376
発行年:
2004
開始ページ:
813
終了ページ:
818
総ページ数:
6
出版情報:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819452894 [0819452890]
言語:
英語
請求記号:
P63600/5376.2
資料種別:
国際会議録

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